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Microfabrication


At INO, the presence of a multidisciplinary team and state-of-the-art equipment allows us to offer unique MEMS foundry-type services. These services include design, prototyping, fabrication, packaging, and testing of various MEMS and MOEMS devices. Device design starts with the evaluation of different structures adapted to a given application. Computer simulation tools and commercial or custom software are used to evaluate the mechanical, optical, thermal, and electromechanical performances. Standard IC manufacturing techniques such as metal, dielectric, and semiconductor film deposition and etching as well as photolithographic pattern transfer are available. More details on INO’s fabrication technologies are provided in the Beam shaping section. Metals such as Au, Ag, Al, Al alloys, Ti, Cr, Cu, Mo, MoCr, Ni, Pt, and V can also be deposited with thickness varying from 5 nm to 2 µm and uniformity in the 2% range. In addition, to answer a customer's needs for broadband microbolometric detectors, INO has developed and built a gold black deposition facility. This gold black facility is now available to all our clients.

We also offer selective electroplating, and molding to customers. What’s more, INO has developed strong expertise in MEMS packaging to ensure device hermeticity while keeping a window open to the outside world. This multifaceted expertise has been put to use manufacturing various types of MEMS devices as well as complex instruments including micromirror-type devices, microfilters, and multipurpose sensors.

INO also has extensive expertise in the fabrication of custom VOx-based uncooled IR bolometric detector arrays. Technology transfer is available.

Equipment list
Lithography
Description Manufacturer Model #
Contact mask aligner Suss MicroTec 260MS143-02
Mask cleaner SSEC 156-SCE
Lithography oven VWR 1602
Vacuum oven Yield Ingineering System Inc 450PB6-2P
Automatic spinner Brewer Science - CEE 100 CB
Automatic development system Brewer Science - CEE 100 CB
Manual spinner Brewer Science - CEE 100 CB
HMDS vapor prime Brewer Science - CEE 100 HMDS
I-line stepper Canon FPA-2500i3
Dry etching
Description Manufacturer Model #
Chlorine R.I.E (reactive ion etching) Plasma therm 790 series
Fluorine R.I.E (reactive ion etching) Plasma Therm 790 series
Uncooled plasma asher Anatech Ltd SCE 600 Quartz 10
Fluorine 10 inch square R.I.E. (reactive ion etching) Plasma therm 790 series
Cooled plasma asher Anatech Ltd SCE 600 Quartz 10
Plasma cleaner March PX-500
Thin films (metals, dielectrics)
Descriptions Manufacturer Model #
3 inch magnetron sputtering system Huntington
6 inch magnetron sputtering system Huntington EV-150
4 inch magnetron sputtering system Semicore SC Triaxis 6X4 sputter
P.E.C.V.D. (plasma enhanced chemical vapor deposition) Plasma Therm Inc 790 series
Reactive sputtering system CVC Product 308414-901
Box coater Balzers BAK760
Box coater Balzers BAP800
Black gold deposition system INO
Plating baths for 100mm wafers (Au,Ni, In) INO
Back end (Packaging)
Description Manufacturer Model #
Dicing saw Disco Hi-Tec America Inc. DAD 320
Laser marking GSI Lumonics Inc XY15MM YAG
Manual wirebonder Hybond 572-31
Glove box INO
Vacuum packaging system INO
Flip chip bonder Finetech A4 (145)
Semi-automatic wirebonder F&K delvotec 5632
Environnemental oven Espec ECT
Vacuum furnace SST 3150
Pinching station for vacuum sealing INO Gen V
Measurements and tests
Description Manufacturer Model #
Profilometer Sloan Technology Corporation DEKTAK /ST
Interferometric microscope Nikon Canada inc
AFM (atomical force microscope) Digital instrument 3000
Probe station Test force system REL-4008
Stress measurement KLA-Tencor FLX 2320
Spectroscopic ellipsometer J.A. Woollam V-Vase
Leak detector Varian VSMD301
Particule counter Met one 3413
Probe station Suss MicroTec PM-8
Wafer inspection station Olympus MX61A
Thin film mapper Filmetrics F50-HS
Portable particule counter Met one HHPC-2A
Spectrometer FTIR Bruker Optics Ltd. Vertex-70
Confocal microscope Olympus OLS31-SU
Spectrometer Perkin Elmer Lambda 950
S.E.M. (secondary electron microscope) HITACHI High-Technologies Canada  Inc. S-3400N
E.D.S (Energy Dispersive Spectroscopy) Oxford instrument Inca
Digital microscope Keyence VHX-1000
Resistivity and TCR probe station Signatone QuadPro
Visible spectrometer Perkin Elmer Lambda 19
GRM characterization system INO
Environmental chamber
Description Manufacturer Model #
Environmental chamber 41 inch Phytronix
Environmental chamber 15 inch INO
Dry box Terra universal
Vacuum jar Abbess Instruments and system INC
Cleaning
Description Manufacturer Model #
Sandblast Canablast DCM-160-6

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